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UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-25 0:07 |
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Conference: Bucharest University Faculty of Physics 2004 Meeting
Section: Optics, Spectroscopy, Plasma and Lasers
Title:
Morphological, optical and electrical properties of ZrO2 and ZrxSiyOz thin films obtained by Pulsed Laser Deposition
Authors:
*M. Filipescu, *N. Scarisoreanu, *D. G. Matei, *G. Dinescu, **F. Iova, **O. Toma, *M. Dinescu
Affiliation:
*National Institute for Laser, Plasma and Radiation Physics, PO Box MG–16 Magurele, Bucharest, RO-077125, **Faculty of Physics, University of Bucharest, Bucharest
E-mail
morarm@ifin.nipne.ro, dinescum@ifin.nipne.ro
Keywords:
ZrO2, Laser ablation, Dielectric constant, Microscopy, Ablation film deposition
Abstract:
Zirconia and zirconat silicate thin films have been deposited by laser ablation of Zr and Zr and Si targets respectively in oxygen reactive atmosphere. A RF beam discharge in oxygen was added to the Pulsed Laser Deposition set-up for some of the experiments. The influence of the deposition parameters as oxygen pressure, laser fluence, laser wavelength, RF power and target composition on the structure and morphology of the deposited layers was studied. Low losses and dielectric constant values in the range of 15-25 for ZrO2 and 10-12 for ZrxSiyOz have been measured respectively for samples deposited by radiofrequency assisted Pulsed Laser Deposition (RF-PLD). Scanning Electron Microscopy and Atomic Force Microscopy investigations showed small surface roughness, of the order of some nm, for films deposited by RF-PLD.
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