UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS

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2024-11-22 1:26

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Conference: Bucharest University Faculty of Physics 2003 Meeting


Section: Atomic and Molecular Physics; Astrophysics


Title:
Investigation on LPCVD SiOn Films by Means of Rutherford Backscattering , FT-IR and UV-VIS Spectroscopy.


Authors:
D.Dudu(1), B.N.Bercu(2), M.Bercu(3), M.Modreanu(3), E.Ivanov(4)


Affiliation:
(1)

(2)

(3) Faculty of Physics, University of Bucharest


E-mail


Keywords:


Abstract:
The SION layers deposited by LPCVD (Low Vapour Chemical Deposition ) on Si (111) substrate has been investigated by complementary techniques as Rutherford backscattering and optical spectroscopy. We have determined the evolution of chemical content in respect with oxygen relative to nitrogen. The change in oxygen content versus time was produced by exposing the sample in wet oxygen at 1000 0C for different periods. The change in oxygen amount was determined by monitoring the Si-O-Si integral intensity of the absorption band at 1071cm-1. Also the behavior of the refractive index versus time in an oxidative atmosphere gave a complementary information about the oxygen content. Alpha scattering spectra obtained by means of cyclotron facilities was used as an other technique on oxygen to nitrogen ratio determination. Both visible spectra and RBS data were fitted by using the corresponding simulating approaches based on light propagation in non-homogeneous media and respectively on multiple scattering theory. The time evolution of O content indicated a diffused controlled process through the gas/solid interface.