UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS

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Conference: Bucharest University Faculty of Physics 2004 Meeting


Section: Optics, Spectroscopy, Plasma and Lasers


Title:
INVESTIGATION OF THE CARBON THIN FILMS DEPOSITED BY REMOTE RADIOFREQUENCY PLASMA FROM ACETYLENE


Authors:
S. Vizireanu, C. Petcu, B. Mitu, G. Dinescu*


Affiliation:
National Institute for Laser, Plasma and Radiation Physics

PO Box MG 16-Magurele, Bucharest, 77125 Romania


E-mail
dinescug@infim.ro


Keywords:
carbon based materials, radiofrequency plasma, plasma assisted chemical vapor deposition


Abstract:
Thin films and structured carbon materials are of large interest for scientific point of view and in various applications as protective hard coatings, reinforcing fibers, anti-friction and anti-sticking layers, etc. In this contribution results about carbon-based materials obtained as thin films by Plasma Assisted Chemical Vapor Deposition are presented. The deposition technique utilizes remote plasma, generated by the expansion of a capacitively coupled radiofrequency discharge through a nozzle in the deposition chamber. Acetylene was used as gas precursor. The precursor was injected downstream, in the argon or argon/nitrogen jet, just after the nozzle. For investigation of carbon materials AFM, XRD, XRR, FTIR and electron microscopy techniques were have used. Depending on the deposition parameters (mass gas flow, pressure, temperature of substrate, deposition time and RF plasma power), different types of materials with various morphologies, structure, purity, surface topography and crystallinity were obtained. The studies showed that the film morphology depends strongly on the temperature and the substrate condition. As example, the carbon film growth on a catalytic metal like Ni, treated in ammonia plasma to modify the roughness, leads to a significant modification of the structure and the morphology as comparing with the growth on silicon. These effects are related to the use of nickel nanoparticles for synthesis of carbon nanotubes.