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UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-22 1:46 |
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Conference: Bucharest University Faculty of Physics 2012 Meeting
Section: Theoretical Physics and Applied Mathematics
Title:
Fourier transform interference lithography
Authors:
M. BULINSKI (1), G. MOAGAR-POLADIAN (2)
Affiliation:
(1) University of Bucharest,Faculty of Physics
(2)National Institute for Research and Development in Microtechnology
E-mail
mbulinsky@lycos.com
Keywords:
interference lithography, Fourier transform, maskless method
Abstract:
We present the concept and simulation results of Fourier transform interference lithography (FTIL) that allows the realization of periodic and non-periodic patterns as well. It makes use of the Fourier transform of the desired intensity pattern and of the cumulative and non-linear response of the photoresist. It is a maskless method using a simple lithography set-up as well as that it can be extended to EUV wavelengths with less stringent requirements, and it is applicable over large areas allowing even the realization of narrow patterns in the immediate vicinity of broader ones. Method is independence of the vertical alignment of the substrate, the system is tolerant to vertical misalignments, since there is no DOF problem. This tolerant behavior is extremely useful in the DUV and EUV regions.The method is applicable for 1D, 2D and 3D case, from visible to EUV. The reconstruction accuracy, with resonable technological complications, is better than 5%, a value that is acceptable for practical applications.
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