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UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-22 1:26 |
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Conference: Bucharest University Faculty of Physics 2001 Meeting
Section: Optics and Spectroscopy
Title:
DEPOSITION OF AMORPHOUS HYDROGENATED CARBON
BY REMOTE RF PLASMA CVD
Authors:
B. Mitu, S. Vizireanu, G. Dinescu, C. Popescu-Mardare*, V. Teodorescu**,
Affiliation:
National Institute for Laser, Plasma and Radiation Physics, P.O. Box MG-36 Magurele, Bucharest, 76900, Romania,
*Faculty of Physics, University of Bucharest, Romania
**National Institute of Material Science, Magurele, Bucharest, Romania
E-mail
Keywords:
Abstract:
Amorphous hydrogenated carbon exhibits very promising properties, namely hardness, chemical inertness and optical transparency. Moreover, the properties are adjustable to a certain extent, depending on the deposition conditions, from soft-polymerlike to hard diamondlike. In this work the deposition of a-C:H thin films by using a remote RF plasma is presented. The RF plasma (13.56 MHz and a maximum power of 500 W) is generated in flowing argon (200 sccm) in a small interelectrodic space. It expands into the deposition chamber through a hole (nozzle) performed in the bottom electrode Acetylene is introduced (flow rate 5-20 sccm) into the post-discharge through an injection chamber placed immediately downstream the nozzle. The deposition is sustained by the dissociation of acetylene in the plasma beam, followed by the transport and deposition of dissociation products on a substrate (crystalline silicon or glass) placed downstream, at tens of centimeters distance from the nozzle. A parametric study of the deposition process by changing the values of RF power (in the range 50-300 watt) and the amount of acetylene in the main gas flow (1=10%) was performed. The properties of the obtained amorphous hydrogenated carbon thin films have been investigated by Fourier Transform Infrared Spectroscopy, UV-VIS absorption and Electron Microscopy.
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