| |
 |
UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-22 2:01 |
 |
|
|
|
Conference: Bucharest University Faculty of Physics 2003 Meeting
Section: Solid State Physics and Materials Science
Title:
The influence of the ion bombardment on the nitride film characteristics deposited by magnetron sputtering
Authors:
V.Braic, G.Pavelescu, M.Braic, M.Balaceanu
Affiliation:
National Institute for Optoelectronics, P.O.Box MG-O5, 76900 Bucharest, Romania
E-mail
Keywords:
Abstract:
Reactive dc magnetron deposition process of nitrides is strongly related to the discharge parameters. As it is well known the energy and intensity of the ion flux impinging on the substrate have a significant influence on the film structure and properties. The aim of this paper was to investigate the effect of the ion bombardment on some characteristics of TiN and (Ti,Al)N coatings deposited on cemented carbide substrates in a magnetron sputtering deposition system. Various ion bombardment conditions were obtained by different bias voltages applied on the substrate. The influence of the process parameters on the film characteristics were put into evidence by X-ray diffraction and by microhardness measurements. Plasma characteristics obtained by optical emission spectroscopy was corroborated with the properties of the deposited films on substrates.
|
|
|
|