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UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-22 2:35 |
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Conference: Bucharest University Faculty of Physics 2001 Meeting
Section: Polymer Physics
Title:
CARBONIZED POLYMER STRUCTURES DEPOSITED ONTO Si SUBSTRATE FOR HIGH TEMPERATURE PHOTORESISTS
Authors:
I.Stamatin, S. Grecu, Anca Dumitru
Affiliation:
Dept. Diamond Film&Plasma Polymerization Lab.
Bucharest- Magurele, MG-11, Romania
E-mail
Keywords:
Abstract:
To design a resist material with these new techniques targeting very high resolutions requires a fundamental understanding of the chemical and physical processes that occurs in the thermal processes at the interface substrate-polymer resists, the interaction with plasma species.
The semiconductor class for high power circuits like SiC, GaN and heterostructures claims photoresists that will interact and give active components/species. The classical photoresists are used only for printing the pattern of the structure, so they have a passive role in the device development. An active photoresist will be that one which interacts with the surface under specific conditions and becomes an active component in the device structure. As example: the heterostructure Si-SiC-C, used in different types of high-power electronic devices.
This paper presents a new method to grow such active heterostructures starting with classical photoresist, in a proper way.
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