| |
 |
UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-22 2:29 |
 |
|
|
|
Conference: Bucharest University Faculty of Physics 2011 Meeting
Section: Solid State Physics and Materials Science
Title:
A Sequential Plasma Deposition Method for Obtaining Hydrogenated Carbon/Metal Nanocomposite Layers
Authors:
A. Segal (1), V. Marascu (2)
, T. Acsente (3) , Daniela Dragoman (1), G. Dinescu (3)
Affiliation:
(1) Faculty of Physics, University of Bucharest, Atomistilor 405, Magurele, Romania
(2) Faculty of Mathematics, University of Bucharest, Academiei 14, Bucharest, Romania
(3) National Institute for Laser, Plasma and Radiation Physics, Bucharest - Magurele, Romania Atomistilor 409/ PO BOX MG16
E-mail
danieladragoman@yahoo.com
tomy@infim.ro
Keywords:
metal/carbon composite films, sequential deposition, optical emission spectroscopy monitoring
Abstract:
Hydrogenated carbon/metal (a-C:H/Me) nanocomposite coatings have applications in many fields of science and modern technology: tribology, sensors, catalytic devices, solar absorbers, etc. For plasma synthesis of such layers, mainly deposition methods are presented in literature, in which the metallic and a-C:H components are simultaneously added on the substrate. In this contribution, we present a different approach, namely a sequential cyclic deposition method. It consists of alternatively exposing the substrate to two plasma sources mounted on the same deposition chamber: a magnetron source (MS) for metal incorporation and a Plasma Enhanced Chemical Vapor Deposition (PECVD) source (with acetylene precursor) for a-C:H deposition. A deposition cycle consists of the following steps: metal deposition by MS (for tM seconds), transport of the substrate to the front of PECVD (performed in tTR seconds), deposition of a-C:H (for tC seconds), and backward transport of the substrate to the front of MS. The thickness of the deposited composite layer is controlled by the number of successive deposition cycles. The values of tTR and tC time durations impose the elemental composition of the deposited layer, while the value of tTR is important in establishing proper atmosphere conditions during deposition steps: Ar with negligible amount of acetylene during the MS step, and a proper mixture of acetylene/Ar during the PECVD step. In order to establish the fulfillment of these conditions Optical Emission Spectroscopy measurements were performed for different values of the transport time, while the other process parameters were kept constant. The material properties (composition, morphology) are discussed in correlation with the studied plasma and gas phase conditions.
|
|
|
|