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UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-27 9:31 |
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Conference: Bucharest University Faculty of Physics 2014 Meeting
Section: Optics, Spectroscopy, Plasma and Lasers
Title:
Plasma applications in microtechnology
Authors:
B.BITA (2), V. COVLEA(1), A. JIPA(1), A. AVRAM(2), FL. CRACIUNOIU(2), B. BUTOI(1), M. BAZAVAN(1), E. BARNA(1)
Affiliation:
1) Faculty of Physics, University of Bucharest, 405 Atomistilor Blv., 077125, Magurele, Romania
2)National Institute for R&D in Microtechnologies, 126A Erou Iancu Nicolae Street, 023573, Bucharest, Romania
E-mail
bogdan.bita@imt.ro
Keywords:
MEMS, PECVD, RIE, Plasma
Abstract:
In this paper is presented the technological process for manufacturing micro-electro-mechanical systems (MEMS). Presented set of masks used photolithographic processes for the deposition of SiO2 and SiNx have been made in plasma-assisted vapor-phase (PECVD), and thicknesses deposited were measured with a refractometer and confirmed by image SEM (Scanning Electron Microscope). Deposited layers were etched in plasma reactive ion etching equipment (RIE).
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