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UNIVERSITY OF BUCHAREST FACULTY OF PHYSICS Guest 2024-11-27 9:35 |
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Conference: Bucharest University Faculty of Physics 2014 Meeting
Section: Optics, Spectroscopy, Plasma and Lasers
Title: New near-field laser processing method based on transparent photorezist masks
Authors: F. JIPA, M. ZAMFIRESCU
Affiliation: 1)National Institute for Laser Plasma and Radiation Physics, Magurele, Bucharest, Romania
E-mail florin.jipa@inflpr.o
Keywords: near-field laser processing, femtosecond lasers, nano-structures
Abstract: In this work is presented a new near-field laser processing method where transparent photorezist masks are used as focusing elements. When the laser pulse propagates through the optical mask, the geometry of the photorezist elements intensifies the laser radiation in near-field regime. Controlling the geometry and the arrangement of these elements any designed pattern can be produces on materials surface by near-field laser ablation. To demonstrate the feasibility of this method, a silicon wafer was processed using two different photorezist masks. The patterns imprinted were investigated with Atomic Force Microscopy (AFM). Structures with dimensions under 250 nm width and 15 nm depth where imprinted on large area using a single laser pulse. Moreover, the theoretic field distribution computed under the photoresist mask with Finite-Difference Time Domain (FDTD) method is in good agreement with the imprinted pattern.
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