Faculty of Physics - University of Bucharest

UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS

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2024-11-27 9:34

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Conference: Bucharest University Faculty of Physics 2014 Meeting

Section: Optics, Spectroscopy, Plasma and Lasers

Title:

Fourier-transform interference lithography

Authors:

M. BULINSKI(1), G. MOAGAR-POLADIAN(2)

Affiliation:

1) Faculty of Physics, University of Bucharest, str. Atomistilor nr. 405, Bucuresti-Magurele, România

2) National Institute for Research and Development in Microtechnology, Str. Erou Iancu Nicolae 126A, Bucuresti, România

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Keywords:

interference lithography, non-periodic patterns, gray lithography

Abstract:

Starting from the concept of interference lithography, developed several years ago, which is currently used in fabrication of 2D and 3D periodical structures in so called holographic lithography, or laser lithography, we analyze in this paper the possibility of practical application of the concept for the realization of non-periodic patterns into a commercial photoresist. We analize the major limitations of the method and solutions to circumvent some of these drawbacks. Fourier-transform interference lithography can be a possible alternative to classical projection lithography, without using expensive masks, in control of the exposure in "gray lithography", using the photoresist nonlinearities under controlled direct exposure.