| |
 |
UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-23 18:23 |
 |
|
|
|
Conference: Bucharest University Faculty of Physics 2016 Meeting
Section: Polymer Physics
Title:
GLAD technique in plasma polimerization. Thin film deposition analysis.
Authors:
Bogdan BUTOI(1,2), Dumitru STAICU(1), Catalin ARMEANU(1), Catalin BERLIC(1), Valentin BARNA(1), Emil BARNA(1)
Affiliation:
1)University of Bucharest, Faculty of Physics, P.O.BOX MG-11, Magurele, Bucharest, Romania
2) National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Street, Magurele, Romania
E-mail
bogdan.butoi@g.unibuc.ro
Keywords:
plasma polymerization, polymer, GLAD depositions
Abstract:
Plasma polymerization is a deposition method that uses plasma to initialize and sustain the polymerization process and deposit the polymers on a substrate while the chains are growing. This method offers some advantages over the classical way of polymerization. The thin films obtained are highly cross-linked and adhere well to the substrate surface.
In this work, we present characterization of the deposition method. The process is done in a DC plasma polymerization reactor with variable geometry. Using DC current, when the monomer is injected in the deposition chamber from a hole inside the anode, ions created by the discharge starts to bombard the monomer. The monomer fragments start to polymerize and a thin film starts to grow on the substrate. The substrate is positioned on a holder that can be manipulated during the deposition, like in GLAD depositions. This is a very important parameter for the growing of nanostructures. The substrate must be able to change the angle it forms with the incident vapors in order to stimulate structure growth by self-shadowing.
Aniline thin films were deposited in different conditions to see what parameters influence the growth of structures the most. These samples were analyzed by SEM and FTIR to see the morphological and structural differences between them.
|
|
|
|