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UNIVERSITY OF BUCHAREST
FACULTY OF PHYSICS Guest
2024-11-23 17:58 |
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Conference: Bucharest University Faculty of Physics 2002 Meeting
Section: Optics, Spectroscopy, Plasma and Lasers
Title:
CARBON CONTAINING THIN FILM DEPOSITION BY A REMOTE RF PLASMA: PROCESS AND MATERIAL CHARACTERIZATION
Authors:
B. Mitu, S. Vizireanu, *V. Ciupina, **V.S. Teodorescu, A. Andrei***, G. Dinescu
Affiliation:
National Institute for Lasers, Plasma and Radiation Physics, Magurele MG-16, Bucharest, Romania;
*University "Ovidius", Constanta, Romania;
**National Institute for Materials Physics, Magurele, Bucharest, Romania
***Institute of Nuclear Research, Pitesti, Romania
E-mail
Keywords:
Abstract:
Carbon based thin films and structures are largely used in various fields and open opportunities for development of new applications in microelectronics, optics, and nanotechnology. A large variety of deposition techniques can be used to obtain films with well-defined characteristics. Even in the frame of the same technique the material can change drastically with the experimental conditions. We have investigated the dependence of material morphology and composition upon the experimental conditions in the case of a remote plasma RF deposition system. Hydrogenated films were obtained by PECVD with carbon species supplied by acetylene gas injected into an Ar plasma stream. By using a mixture of Ar/N2 the films were nitrogenated. Also, hydrogen free nitrogenated films were deposited with carbon species supplied by graphite surfaces in contact with nitrogen containing discharge. Depending on the pressure, precursor flow rate and downstream substrate position particulates of various sizes were obtained. The material characterization was conducted by Fourier Transformed Infrared Spectroscopy, UV-VIS absorption and electron microscopy techniques.
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